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Development of a charge-carrier drift velocity measurement system in diamonds by using a UV pulse laser

机译:利用紫外脉冲激光开发金刚石中的载流子漂移速度测量系统

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摘要

There are continuing efforts of developing faster FETs and diamond is one of the strong candidates as a base semiconductor. Since the upper-limit-frequency of diamond FETs determines saturated drift velocities of charge-carriers, we need to first characterize diamond to develop better FETs. It is, however, not easy to measure the velocities with response time of less than 20 ns. Therefore, we developed a drift velocity measurement system using a time-of-flight (TOF) technique with a UV laser with 100 ps pulse width. In order to realize response times faster than 20 ns, we employed a 50 Ω coaxial cable as a load, with which we could effectively reduce the stray capacitance and inductance, and also, suppress reflections in the signal which gives false signals. As a result, we can measure carrier-transit times shorter than 10 ns.
机译:人们一直在努力开发更快的FET,金刚石是作为基础半导体的强大候选之一。由于金刚石FET的上限频率决定了电荷载流子的饱和漂移速度,因此我们需要首先表征金刚石才能开发出更好的FET。但是,测量响应时间小于20 ns的速度并不容易。因此,我们开发了一种使用飞行时间(TOF)技术和100 ps脉冲宽度的UV激光器的漂移速度测量系统。为了实现比20 ns更快的响应时间,我们使用50Ω同轴电缆作为负载,这样可以有效降低杂散电容和电感,还可以抑制信号中的反射,从而产生虚假信号。结果,我们可以测量出小于10 ns的载波传输时间。

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